Unraveling Phonon Thermal Hall Mysteries Through Magnetic Field Manipulation
The Puzzling Phenomenon of Phonon Thermal Hall Effects In the realm of thermal transport physics, researchers are grappling with a…
The Puzzling Phenomenon of Phonon Thermal Hall Effects In the realm of thermal transport physics, researchers are grappling with a…
Scientists have unveiled a revolutionary dual-protective-layer photolithography strategy that enables non-destructive patterning of organic electronic materials. The breakthrough technique achieves sub-micron feature sizes while maintaining 100% yield, opening new possibilities for flexible electronics and wearable technology.
Researchers have developed a universal microlithographic strategy that enables high-precision manufacturing of organic electronic devices without damaging sensitive materials, according to reports in Nature Communications. The innovative approach, termed DPL-photolithography, utilizes dual protective layers to safeguard organic materials during the complex photolithography process, achieving feature sizes as small as 0.5 micrometers while maintaining perfect yield rates.